Altera Applies Best Practices from .13-micron to 90-nm Chip Design

SAN JOSE, Calif., Jan. 5 /PRNewswire-FirstCall/ --

   What:     Altera Corporation (NASDAQ: ALTR) will discuss its successful
             ramp to .13-micron volume production and best practices for
             90-nm.

   Speaker:  Ben Lee, vice president and general manager, Altera Asia
             Pacific

   When:     Executive Panel II: "Optimizing for Manufacturability and
             Profitability at 90nm and Beyond."
             3:00 P.M. - 4:30 P.M.

   Where:    Semico Impact Conference Series-90 Nanometer and Beyond
             Thursday, January 8, 2004
             8:00 A.M. - 6:30 P.M.

             Grand Formosa Regent Taipei
             41 Chung Shan N. Rd. Section 2
             Taipei, Taiwan
             Tel: (02)2523-8000

   Contact:  Ami Dorrell
             Altera Corporation
             408-544-6397
             newsroom@altera.com

  For additional information, please visit: http://www.semico.com/taipei/

NOTE: Altera, The Programmable Solutions Company, the stylized Altera logo, specific device designations, and all other words that are identified as trademarks and/or service marks are, unless noted otherwise, the trademarks and service marks of Altera Corporation in the U.S. and other countries. All other product or service names are the property of their respective holder.

CONTACT: Ami Dorrell of Altera Corporation, +1-408-544-6397, or
newsroom@altera.com

Web site: http://www.altera.com/